Method and apparatus for balancing an electrostatic force produc

Details Method and apparatus for balancing an electrostatic force produc Method and apparatus for balancing an electrostatic force produc

1998-06-05

1999-07-13

Fleming, Fritz

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

279128, H02N 1300

Patent

active

059235217

ABSTRACT:
An electrostatic chuck containing apparatus, and a concomitant method, for balancing the electrostatic force that the chuck imparts upon a workpiece. More specifically, the electrostatic chuck contains a chuck body having a pair of coplanar electrodes embedded therein and a wafer spacing mask containing a plurality of conductive support members deposited upon a support surface of the chuck body. The support members maintain a wafer, or other workpiece, in a spaced-part relation with respect to the support surface of the chuck body. Each electrode within the chuck is respectively connected to a terminal dual voltage power supply having a center tap. The center tap of the power supply is connected to the wafer spacing mask. As such, variations in the distance between the wafer and the electrodes due to variations in dielectric thickness, wafer backside roughness, chuck surface roughness, chuck surface conductivity or other physical variations that may cause changes in the electrostatic force are balanced by having the spacing mask connected to the center tap of the power supply.

REFERENCES:
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4665463 (1987-05-01), Ward et al.
patent: 5452177 (1995-09-01), Frutiger
patent: 5572398 (1996-11-01), Federlin et al.
patent: 5764471 (1998-06-01), Burkhart

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