Method and apparatus for generating highly dense uniform plasma

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

31511121, 31511171, 31511181, 118723R, H01J 724

Patent

active

053451457

ABSTRACT:
A plasma generating method comprises: a first step of disposing a plurality of lateral electrodes at lateral sides of a plasma generating part in a vacuum chamber; a second step of respectively applying, to the lateral electrodes, high frequency electric powers of which frequencies are the same as one another and of which phases are different from one another, thereby to excite, in the plasma generating part, a high frequency rotating electric field to cause electrons under translational motions in the plasma generating part to present oscillating or rotating motions; and a third step of applying, to the plasma generating part, a magnetic field substantially at a right angle to the working plane of the high frequency rotating electric field, thereby to convert the translational movement of the electrons in the plasma generating part into revolving motions under oscillating or rotating motions by which the electrons revolve in the plasma generating part. The high frequency rotating electric field and the magnetic field cause the electrons in the plasma generating part to be confined therein.

REFERENCES:
patent: 3442758 (1969-05-01), Penfold et al.
patent: 3523206 (1970-08-01), Drabier et al.
patent: 4572759 (1986-02-01), Benzing
patent: 4585668 (1986-04-01), Asmussen
patent: 4589123 (1986-05-01), Pearlman et al.
patent: 4630566 (1986-12-01), Asmussen et al.
patent: 4792732 (1988-12-01), O'loughlin
patent: 4859908 (1989-08-01), Yoshida et al.
patent: 5038713 (1991-08-01), Kawakami et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for generating highly dense uniform plasma does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for generating highly dense uniform plasma , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for generating highly dense uniform plasma will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1331513

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.