Method of producing smooth titanium nitride films having low res

Details Method of producing smooth titanium nitride films having low res Method of producing smooth titanium nitride films having low res

1997-03-27

1999-07-20

King, Roy V.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429806, C23C 1434

Patent

active

059252251

ABSTRACT:
The resistivity of titanium nitride films is reduced, by about 40% (to less than about 60 .mu. Ohm-cm), for example; and, the film surface roughness is reduced, by about 45% (to less than 6 .ANG.) by using a combination of particular process conditions during deposition of the film by an ion-deposition sputtering process.

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