4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Yusuke Hirayama

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Etching method and computer-readable storage medium

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Parallel plate sputtering device with RF powered auxiliary elect

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Plasma etching device

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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Processing method for conservation of processing gases

Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1636149

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