4. Semiconductor device manufacturing: process
  5. Gettering of substrate
  6. By vapor phase surface reaction

Yong-Pil Han

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HF vapor phase wafer cleaning and oxide etching

Etching a substrate: processes – Gas phase etching of substrate – Etching vapor produced by evaporation – boiling – or sublimation
Reexamination Certificate

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Semiconductor device including a planarized surface and...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
Reexamination Certificate

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Vapor phase cleaning of alkali and alkaline earth metals

Semiconductor device manufacturing: process – Gettering of substrate – By vapor phase surface reaction
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Profile ID: LFUS-PAI-P-809744

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