4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Yasunori Ohno

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High frequency plasma generation apparatus

Electricity: electrical systems and devices – Electric charge generating or conducting means
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Ion source

Radiant energy – Ion generation – Field ionization type
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Ion source

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
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Ion source device

Radiant energy – Ion generation – Electron bombardment type
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Method and apparatus for forming a film

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-561106

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