Electricity: electrical systems and devices – Electric charge generating or conducting means
Patent
1985-12-09
1987-12-29
Hix, L. T.
Electricity: electrical systems and devices
Electric charge generating or conducting means
20419234, 31511171, H05H 116
Patent
active
047164913
ABSTRACT:
In a high frequency plasma generation apparatus used in a reactive ion etching apparatus, an ion shower apparatus, a sputter apparatus, etc. for fabricating thin films or semiconductor devices for which a fine patterning process is required, electrical breakdown is apt to be provoked at the surface of a high frequency coil, because the high frequency coil is usually inserted in a plasma. In order to remove this drawback, according to this invention, the high frequency coil is disposed in the plasma production chamber at the neighborhood of the cylindrical side wall, and thus a plasma confinement domain is formed inside of this high frequency coil by use of a magnetic field production device which generates a multi-cusp magnetic field so that the plasma confinement domain is separated from the high frequency coil. In this way, electrical breakdown on the surface of the high frequency coil is prevented and thus the apparatus according to this invention can work stably for a long time.
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Kurosawa Tomoe
Ohno Yasunori
Ohshita Youichi
Sato Tadashi
Hitachi , Ltd.
Hix L. T,.
Rutledge D.
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