4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

William W. Hicks

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Ion implantation apparatus for controlling the surface potential

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Method for plating copper on steel rods

Chemistry: electrical and wave energy – Processes and products
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Modified RIE chamber for uniform silicon etching

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Radiation heated acceleration

Electric lamp and discharge devices – With temperature modifier
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Profile ID: LFUS-PAI-P-437632

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