Cleaning and liquid contact with solids
Processes
Using solid work treating agents
Inventor
active
Disposable-spacer damascene-gate process for SUB 0.05 &mgr;m...
Film removal by chemical transformation and aerosol clean
Freestanding multilayer IC wiring structure
Freestanding multilayer wiring structure
Method of making MOSFET with high dielectric constant gate...
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Profile ID: LFUS-PAI-P-607397