Optical: systems and elements – Single channel simultaneously to or from plural channels – By partial reflection at beam splitting or combining surface
Reexamination Certificate
2005-02-22
2005-02-22
Wells, Nikita (Department: 2881)
Optical: systems and elements
Single channel simultaneously to or from plural channels
By partial reflection at beam splitting or combining surface
C359S366000, C359S487030, C359S727000, C250S365000, C250S372000, C250S455110, C250S50400H
Reexamination Certificate
active
06859328
ABSTRACT:
A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
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Antoni Martin
Dinger Udo
Mann Hans-Juergen
Schultz Jörg
Schuster Karl-Hein
Carl Zeiss Semiconductor
El-Shammaa Mary
Ohlandt Greeley Ruggiero & Perle LLP
Wells Nikita
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