4. Measuring and testing
  5. Gas analysis
  6. By vibration

Tseng-Chung Lee

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Active neural network determination of endpoint in a plasma etch

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Patent

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Damascene capacitors for integrated circuits

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Dynamic data visualization

Image analysis – Applications – Manufacturing or product inspection
Patent

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Etch endpoint detection

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Measurement and control of linewidths in periodic structures usi

Optics: measuring and testing – By polarized light examination – Of surface reflection
Patent

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Profile ID: LFUS-PAI-P-651540

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