Toshiyuki Ota

Inventor

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Chemically amplified resist

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Chemically amplified resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Chemically amplified resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Chemically amplified resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

I-ray sensitive positive resist composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Toshiyuki Ota does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Toshiyuki Ota, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Toshiyuki Ota will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-86781

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.