Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-01-29
1997-05-13
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430176, 430177, 430905, G03F 7004
Patent
active
056291353
ABSTRACT:
Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
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Solid State Technology, Aug. 1991, No. 8, vol. 34, Angelo A. Lamola, et al., "Chemically Amplified Resists", pp. 53-60.
Derwent Publications Ltd., JP-A-5034903, Feb. 12, 1993.
Kobayashi Eiichi
Murata Makoto
Ota Toshiyuki
Tsuji Akira
Chu John S.
Japan Synthetic Rubber Co. Ltd.
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