Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-11-10
1996-12-03
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430917, 430920, 522 31, 522 78, 522126, 522129, G03C 173, G03F 7038
Patent
active
055806953
ABSTRACT:
A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist. Said resist is superior in developability, pattern form, resolution, focus tolerance and yield of residual film thickness, has good process stability, and can be suitably used even in irradiation with, in particular, a radiation having a wavelength equal to or smaller than far ultraviolet rays, for example, an excimer laser or the like.
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Solid State Technology, vol. 34, No. 8, Aug. 1991, pp. 53-60, A. A. Lamola, et al., "Chemically Amplified Resists".
Kobayashi Eiichi
Miura Takao
Murata Makoto
Ota Toshiyuki
Yumoto Yoshiji
Dote Janis L.
Japan Synthetic Rubber Co. Ltd.
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