Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-02-12
1999-06-29
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430176, 430905, G03F 7016, G03C 154
Patent
active
059167297
ABSTRACT:
Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
REFERENCES:
patent: 4550069 (1985-10-01), Pampalone
patent: 5066561 (1991-11-01), Pampalone
patent: 5143814 (1992-09-01), Pampalone
patent: 5314782 (1994-05-01), Lazarus et al.
patent: 5332650 (1994-07-01), Murata et al.
patent: 5342734 (1994-08-01), Lazarus et al.
patent: 5346803 (1994-09-01), Crivello et al.
patent: 5397679 (1995-03-01), Ueda et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 5679495 (1997-10-01), Yamachika et al.
patent: 5731125 (1998-03-01), Yamachika et al.
Solid State Technology, Aug. 1991, No. 8, vol. 34, Angelo A. Lamola et al., Chemically Amplified Resists, pp. 53-60.
Derwent Publications Ltd., JP-A-5034903, Feb. 12, 1993.
G. Pawlowski, et al., Journal of Photopolymer Science and Technology, vol. 5, No. 1, pp. 55-66, "Chemical Amplification & Dissolution Inhibition: A Novel High Performance Positive Tone Deep UV Resist", 1992.
Kobayashi Eiichi
Murata Makoto
Ota Toshiyuki
Tsuji Akira
Chu John S.
JSR Corporation
LandOfFree
Chemically amplified resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chemically amplified resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemically amplified resist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1374625