4. Semiconductor device manufacturing: process
  5. Coating of substrate containing semiconductor region or of...
  6. Multiple layers

Tina Wagner

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Hard mask integrated etch process for patterning of silicon...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
Reexamination Certificate

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Hard mask process to prevent surface roughness for selective...

Baths – closets – sinks – and spittoons – Tubs – Particular construction or configuration details
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Method for forming a TiN layer on top of a metal silicide...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Process for fabricating a semiconductor structure having a self-

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Structure and method for formation of a blocked silicide...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Profile ID: LFUS-PAI-P-1808033

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