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Thomas Weller Mountsier

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Chemical vapor deposition of low density silicon dioxide films

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate

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Chemical vapor deposition of low density silicon dioxide films

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Composite having voids in a component
Patent

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Interlevel dielectric stack containing plasma deposited...

Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating
Reexamination Certificate

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Plasma deposited fluorinated amorphous carbon films

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Profile ID: LFUS-PAI-P-1156053

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