4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Theodoros Panagopoulos

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Dual plasma source process using a variable frequency...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Method and apparatus for controlling temperature of a substrate

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
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Method and apparatus for controlling temperature of a substrate

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
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Method and apparatus for controlling temperature of a substrate

Coating apparatus – Gas or vapor deposition – With treating means
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Plasma control using dual cathode frequency mixing

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Profile ID: LFUS-PAI-P-2888181

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