Method and apparatus for controlling temperature of a substrate

Details Method and apparatus for controlling temperature of a substrate Method and apparatus for controlling temperature of a substrate

2004-10-07

2009-06-09

MacArthur, Sylvia R. (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345270, C361S234000, C279S128000

Reexamination Certificate

active

07544251

ABSTRACT:
A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes a support member that is coupled to a base by a material layer. The material layer has at least two regions having different coefficients of thermal conductivity. In another embodiment, the support member is an electrostatic chuck. In further embodiments, a pedestal assembly has channels formed between the base and support member for providing cooling gas in proximity to the material layer to further control heat transfer between the support member and the base, thereby controlling the temperature profile of a substrate disposed on the support member.

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