4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Tatsuo Asamaki

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Apparatus for processing an object by gas plasma with a reduced

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Ion beam generating apparatus

Electric lamp and discharge devices – With positive or negative ion acceleration
Patent

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Plasma processing apparatus

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent

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Profile ID: LFUS-PAI-P-81437

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