Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1987-09-15

1990-08-21

Boudreau, Leo H.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 31511171, 31323131, H01J 724

Patent

active

049509560

ABSTRACT:
A plasma processing apparatus comprises a vacuum vessel, an anode and a cathode arranged in the vacuum vessel, and a discharge producing power source for intermittently producing main discharge between the anode and the cathode to process a substrate arranged in the proximity of the anode and the cathode. The discharge producing power source comprises a magnetic field setting device including magnetic coils arranged closely to the vacuum vessel and having pole pieces and alternate current power sources for the magnetic coils. The plasma processing apparatus is able to remarkably increase processing speeds and considerably reduce the temperature rise and damage therefrom of substrates to be processed. Moreover, the magnetic field setting device is arranged in a small size to make the plasma processing apparatus compact and small-sized.

REFERENCES:
patent: 4521717 (1985-06-01), Kieser
patent: 4694222 (1987-09-01), Wakalopulos
patent: 4707637 (1987-11-01), Harvey
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4728863 (1988-03-01), Wertheimer
patent: 4767641 (1988-08-01), Kieser et al.
patent: 4767931 (1988-08-01), Sato et al.
patent: 4774437 (1988-09-01), Helmer et al.

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