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Tamae Haruki

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Automatic revision of semiconductor device layout for solving co

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Patent

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Fine pattern lithography with positive use of interference

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
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Fine pattern lithography with positive use of interference

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent

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Method and device for proximity-effect correction

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Optical exposure method

Radiation imagery chemistry: process – composition – or product th – Effecting frontal radiation modification during exposure,...
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Profile ID: LFUS-PAI-P-368984

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