4. Dynamic magnetic information storage or retrieval
  5. Head
  6. Hall effect

Takaya Nakabayashi

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Basic material for patterning and patterning method

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate

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Magnetoresistive effect device utilizing an oxide layer adjacent

Dynamic magnetic information storage or retrieval – Head – Hall effect
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Molecular beam source and molecular beam epitaxy apparatus

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Reexamination Certificate

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Thin film transistor, liquid crystal display apparatus,...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1343432

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