4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Takahiro Takisawa

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Plasma processing apparatus

Coating apparatus – Gas or vapor deposition – With treating means
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Sputtering apparatus and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Sputtering electrode

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-849451

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