Sputtering electrode

Details Sputtering electrode Sputtering electrode

1994-06-24

1996-04-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2042982, C23C 1435

Patent

active

055121560

ABSTRACT:
A magnetron sputtering electrode assembly which is used in a sputtering system having a rectangular flat-plate target, includes permanent magnets arranged along the longitudinal edges of the target to pass lines of magnetic forces in parallel to the surface of the rectangular flat-plate target, and a driving device for reversing polarity of the magnets to change by 180 degrees the direction of the lines of magnetic force caused by the permanent magnets passing in parallel to the surface of the rectangular flat-plate target.

REFERENCES:
patent: 3956093 (1976-05-01), McLeod
patent: 5069772 (1991-12-01), Fritsche et al.
patent: 5106470 (1992-04-01), Takei et al.
patent: 5133850 (1997-07-01), Kukla et al.
patent: 5399253 (1995-03-01), Grunenfelder
patent: 5403457 (1995-04-01), Nago et al.

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