4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask is multilayer resist

Shi-Yong Yi

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Method of fine patterning semiconductor device

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Silazane compound amd methods for using the same

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate

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Thinner composition and method of removing photoresist using...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2174400

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