Silazane compound amd methods for using the same

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S314000, C430S315000, C430S313000, C430S317000

Reexamination Certificate

active

07070910

ABSTRACT:
An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula,A method for forming a photoresist pattern using the adhesive compound is also disclosed.

REFERENCES:
patent: 58-112078 (1983-07-01), None
patent: 7-335603 (1995-12-01), None
Abstract of JP58188132, Feb. 11, 1983. reference was submitted by applicant but not cited on the 1449.

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