Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-07-04
2006-07-04
Barts, Samuel (Department: 1621)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S314000, C430S315000, C430S313000, C430S317000
Reexamination Certificate
active
07070910
ABSTRACT:
An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula,A method for forming a photoresist pattern using the adhesive compound is also disclosed.
REFERENCES:
patent: 58-112078 (1983-07-01), None
patent: 7-335603 (1995-12-01), None
Abstract of JP58188132, Feb. 11, 1983. reference was submitted by applicant but not cited on the 1449.
Kim Jae-Ho
Kim Kyoung-Mi
Kim Young-Ho
Yi Shi-Yong
Youn Yeu-Young
Barts Samuel
Volentine Francos & Whitt PLLC
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