4. Single-crystal, oriented-crystal, and epitaxy growth processes;
  5. Forming from vapor or gaseous state
  6. Including change in a growth-influencing parameter

Shamin Ahmed

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Chemical mechanical polishing thickness control in magnetic...

Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
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Flat panel display with spaced apart gate emitter openings

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
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Method for producing magnetic memory device

Semiconductor device manufacturing: process – Chemical etching – Having liquid and vapor etching steps
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Method of forming pillars in a fully integrated thermal...

Etching a substrate: processes – Forming or treating thermal ink jet article
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Method of growing 4H silicon carbide crystal

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – Including change in a growth-influencing parameter
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