4. Semiconductor device manufacturing: process
  5. Including control responsive to sensed condition
  6. Optical characteristic sensed

Seon-Mee Cho

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Apparatus for reducing plasma charge damage for plasma...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

CVD plasma assisted lower dielectric constant SICOH film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

CVD plasma assisted lower dielectric constant sicoh film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

CVD plasma assisted lower dielectric constant SICOH film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

In-situ dose monitoring using optical emission spectroscopy

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Seon-Mee Cho does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Seon-Mee Cho, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Seon-Mee Cho will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2311481

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure