Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-05-02
2006-05-02
Ghyka, Alexander (Department: 2812)
Coating apparatus
Gas or vapor deposition
With treating means
C118S715000, C438S787000, C438S788000
Reexamination Certificate
active
07036453
ABSTRACT:
A method is provided for depositing a thin film on a substrate in a process chamber with reduced incidence of plasma charge damage. A process gas containing a precursor gases suitable for forming a plasma is flowed into a process chamber, and a plasma is generated from the process gas to deposit the thin film on the substrate. The precursor gases are flowed into the process chamber such that the thin film is deposited at the center of the substrate more rapidly than at an edge of the substrate.
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Aruga Michio
Cho Seon-Mee
Demos Alexandros T.
Gao Feng
Ishikawa Tetsuya
Applied Materials Inc.
Ghyka Alexander
Townsend & Townsend & Crew
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