4. Heating
  5. Accessory means for holding, shielding or supporting work...
  6. Support structure for heat treating ceramics

Ryota Sasajima

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Heat treatment apparatus and method of manufacturing substrate

Heating – Accessory means for holding – shielding or supporting work... – Support structure for heat treating ceramics
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Heat treatment apparatus and method of manufacturing substrates

Heating – Accessory means for holding – shielding or supporting work...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Heat-treating apparatus and method of producing substrates

Heating – Work feeding – agitating – discharging or conveying... – Having closure or seal for work feeder's entrance passage
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method of manufacturing semiconductor device, method of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Substrate processing apparatus having covered thermocouple...

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including heat exchanger for reaction chamber or reactants...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ryota Sasajima does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Ryota Sasajima, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ryota Sasajima will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2163100

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure