Substrate processing apparatus having covered thermocouple...

Details Substrate processing apparatus having covered thermocouple... Substrate processing apparatus having covered thermocouple...

2006-08-04

2010-10-26

Lee, Hsien-ming (Department: 2823)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

C438S795000, C257SE21328

Reexamination Certificate

active

07820118

ABSTRACT:
To provide a substrate treatment apparatus capable of performing temperature control in a reaction tube with accuracy.A substrate treatment apparatus100includes: a reaction tube42for treating a substrate54; a heater46for heating the substrate54in the reaction tube42; a cooling air channel72for circulating cooling air70outside the reaction tube42; and a thermocouple82for detecting temperature around the reaction tube42. The thermocouple82is disposed in the cooling air channel72for circulating cooling air70in a state where the thermocouple82is covered with a protection tube86, and a cover88for intercepting flow toward the protection tube86of the cooling air70is disposed outside the protection tube86.

REFERENCES:
patent: A-01-239842 (1989-09-01), None
patent: A-07-263369 (1995-10-01), None
patent: A-08-210923 (1996-08-01), None
patent: A-11-064115 (1999-03-01), None
patent: A-11-260725 (1999-09-01), None
patent: A-2000-031062 (2000-01-01), None
patent: A-2000-150404 (2000-05-01), None
patent: A-2005-209754 (2005-08-01), None

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