Heat treatment apparatus and method of manufacturing substrate

Details Heat treatment apparatus and method of manufacturing substrate Heat treatment apparatus and method of manufacturing substrate

2011-02-22

2011-02-22

Wilson, Gregory A (Department: 3749)

Heating

Accessory means for holding, shielding or supporting work...

Support structure for heat treating ceramics

C211S041180

Reexamination Certificate

active

07891975

ABSTRACT:
Heat treatment apparatus and a method of manufacturing a substrate are provided, in which drop of particles produced by a rubbing action between a support strip and a support member can be prevented. Heat treatment apparatus10has a reactor40for treating a substrate, and a support tool30for supporting the substrate54in the reactor40. The support tool30has a support part57to be contacted to the substrate54, and a support strip67for supporting the support part57. A back of the support part57has a convex portion or a concave portion, and the back of the support part54is configured to be not contacted to an edge of the support strip67, and contacted to a top of the support strip67at inner than the edge of the support strip67.

REFERENCES:
patent: 5586880 (1996-12-01), Ohsawa
patent: 6099302 (2000-08-01), Hong et al.
patent: 6280183 (2001-08-01), Mayur et al.
patent: 6474987 (2002-11-01), Nakai et al.
patent: 6796439 (2004-09-01), Araki
patent: 7204887 (2007-04-01), Kawamura et al.
patent: 7210925 (2007-05-01), Adachi
patent: 7241141 (2007-07-01), Wedel
patent: 7329947 (2008-02-01), Adachi et al.
patent: 7331780 (2008-02-01), Adachi
patent: 7625205 (2009-12-01), Sasajima et al.
patent: 2003/0170583 (2003-09-01), Nakashima et al.
patent: 2003/0186563 (2003-10-01), Kobayashi et al.
patent: U-2-88233 (1990-07-01), None
patent: A 2004-014829 (2004-01-01), None
patent: A 2004-047911 (2004-02-01), None
patent: A 2004-111781 (2004-04-01), None
patent: A 2004-214260 (2004-07-01), None
patent: WO 2004-030073 (2004-04-01), None

Affiliated with

Also associated with

Rating

Heat treatment apparatus and method of manufacturing substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heat treatment apparatus and method of manufacturing substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heat treatment apparatus and method of manufacturing substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2620937