4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Ryoji Hamasaki

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Method and apparatus for plasma processing

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Patent

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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Plasma processing apparatus and plasma processing method in whic

Electric heating – Metal heating – By arc
Patent

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Plasma processing method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Profile ID: LFUS-PAI-P-507688

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