4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Roland Tso

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Internally cooled target assembly for magnetron sputtering

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Point-of-use vaporization system and method

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
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Sputtering apparatus with a rotating magnet array having a geome

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-1389526

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