Sputtering apparatus with a rotating magnet array having a geome

Details Sputtering apparatus with a rotating magnet array having a geome Sputtering apparatus with a rotating magnet array having a geome

1992-08-27

2000-02-15

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429818, 20429819, 2042982, 20429821, 20429822, C23C 1434

Patent

active

060248432

ABSTRACT:
A magentron sputtering apparatus includes a rotatable magnet which is either concave or convex. For one magnet structure, at least a portion of the centerline of the magnet lies along a curve defined by ##EQU1## where .xi.(r) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

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