Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1998-04-23
2000-02-08
Nakarani, D. S.
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
118715, 261142, C23C 1600
Patent
active
060224169
ABSTRACT:
A point-of-use vaporization system for use in Chemical Vapor Deposition having a first delivery member for delivering a liquid precursor to a vaporization point, a second delivery member for separately delivering a solvent to the vaporization point, and a frit for vaporizing the precursor and solvent at the vaporization point.
REFERENCES:
patent: 5312509 (1994-05-01), Eschbach
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5776254 (1998-07-01), Yuuki et al.
Nakarani D. S.
Novellus Systems Inc.
Tso Roland
LandOfFree
Point-of-use vaporization system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Point-of-use vaporization system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Point-of-use vaporization system and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1677854