Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-04-11
1999-11-16
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429812, 2042982, 20429822, C23C 1434
Patent
active
059851155
ABSTRACT:
An internally cooled target assembly for use in a magnetron sputtering apparatus is provided. The internally cooled target assembly includes a cooling plate that is configured to promote highly turbulent coolant flow through the target assembly to achieve efficient and uniform target cooling. The volume of coolant required to cool the target assembly is minimized.
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Cochran Ronald R.
Harra David J.
Hartsough Larry D.
Jiang Mingwei
Nguyen Nam
Novellus Systems Inc.
Tso Roland
Ver Steeg Steven H.
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