4. Compositions
  5. Compositions containing a single chemical reactant or plural...
  6. Organic reactant

Robert F. Aycock

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Boron trifluoride system for plasma etching of silicon dioxide

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
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Composition and method for forming a doped oxide film

Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant
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Spin-on dopant method

Coating processes – Electrical product produced – Condenser or capacitor
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Profile ID: LFUS-PAI-P-853861

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