4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Ravi Iyer

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Aluminum film for semiconductive devices

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration
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Apparatus and method to increase gas residence time in a reactor

Coating apparatus – Gas or vapor deposition – With treating means
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Apparatus to increase gas residence time in a reactor

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Apparatus to increase gas residence time in a reactor

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Chemical vapor deposition of titanium from titanium tetrachlorid

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Profile ID: LFUS-PAI-P-25287

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