4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Ratnaji R. Kola

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Apparatus for depositing low stress films

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Material removal with focused particle beams

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
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Process for reduced stress tungsten deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Reduced stress tungsten deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Profile ID: LFUS-PAI-P-415255

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