4. Electrolysis: processes, compositions used therein, and methods
  5. Electrolytic material treatment
  6. Water, sewage, or other waste water

Pre-Tech Co., Ltd.

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Apparatus and method for cleaning a precision substrate

Cleaning and liquid contact with solids – Apparatus – Movably mounted fluid-holding receptacles
Patent

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Apparatus and method for cleaning semiconductor wafers

Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment – Water – sewage – or other waste water
Patent

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Apparatus and method for cleaning semiconductor wafers

Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment – Water – sewage – or other waste water
Patent

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Apparatus for cleaning silicon wafer

Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent

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Cleaning apparatus

Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
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