Apparatus for cleaning silicon wafer

Details Apparatus for cleaning silicon wafer Apparatus for cleaning silicon wafer

1991-12-10

1993-02-16

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 953, 1341021, 134902, 134184, 134199, 134200, B08B 310

Patent

active

051861925

ABSTRACT:
Device for cleaning silicon wafers having an upper mist-generating chamber with a high frequency oscillator to generate an aqueous hydrofluoric acid mist and a lower region processing chamber separated by a partitioning wall having a shutter to open and close. Silicon wafers are held in an upright position in a rack. The processing chamber and the shutter have gas jets to eject gas between the silicon wafers and water spray heads in the processing chamber to spray water between the silicon wafers.

REFERENCES:
patent: 3734108 (1973-05-01), Almegard et al.
patent: 4694527 (1981-09-01), Yoshizawa
patent: 4777970 (1988-10-01), Kusuhara
patent: 4983223 (1991-01-01), Gessner
patent: 5027841 (1991-07-01), Breunsbach et al.
patent: 5069235 (1991-12-01), Vetter

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