Cleaning apparatus

Details Cleaning apparatus Cleaning apparatus

1997-02-19

1999-07-27

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134144, 134902, B08B 302

Patent

active

059273054

ABSTRACT:
A cleaning apparatus is disclosed which is capable of simultaneously and precisely cleaning two sides of a substrate required to be cleaned, such as a silicon wafer. The cleaning apparatus has a holding unit for horizontally holding a substrate required to be cleaned, a rotating unit for rotating the holding unit, a first cleaning-fluid injection unit disposed above the holding unit and arranged to inject cleaning fluid with high-frequency acoustic waves to the surface of the substrate supported by the holding unit and a second cleaning-fluid injection unit disposed below the holding unit and arranged to inject cleaning fluid to the reverse side of the substrate supported by the holding unit.

REFERENCES:
patent: 4489740 (1984-12-01), Rattan et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5361449 (1994-11-01), Akimoto
patent: 5584310 (1996-12-01), Bergman et al.
patent: 5706843 (1998-01-01), Matsuo

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