4. Optical: systems and elements
  5. Light interference
  6. Produced by coating or lamina

Paul B. Mirkarimi

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EUV lithography reticles fabricated without the use of a...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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High reflectance-low stress Mo-Si multilayer reflective coatings

Stock material or miscellaneous articles – All metal or with adjacent metals – Composite; i.e. – plural – adjacent – spatially distinct metal...
Patent

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Method for fabricating reticles for EUV lithography without...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Method for the manufacture of phase shifting masks for EUV...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Method to adjust multilayer film stress induced deformation of o

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Patent

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Profile ID: LFUS-PAI-P-704248

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