Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-04-04
2006-04-04
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07022435
ABSTRACT:
A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.
REFERENCES:
patent: 5503950 (1996-04-01), Miyake et al.
patent: 6645679 (2003-11-01), La Fontaine et al.
patent: 6821682 (2004-11-01), Stearns et al.
patent: 2003/0190532 (2003-10-01), Yan
Barty Anton
Mirkarimi Paul B.
Stearns Daniel G.
Sweeney Donald W.
EUV Limited Liability Corporation
Rosasco S.
Thompson Alan H.
Wooldridge John P.
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