High reflectance-low stress Mo-Si multilayer reflective coatings

Details High reflectance-low stress Mo-Si multilayer reflective coatings High reflectance-low stress Mo-Si multilayer reflective coatings

1998-02-20

2000-08-29

Jones, Deborah

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

428450, 428663, 428687, 428336, 428216, 428220, 4273722, 4273833, 359584, B32B 1504, B32B 3300, B05D 302

Patent

active

061106070

ABSTRACT:
A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

REFERENCES:
patent: 4783379 (1988-11-01), Wickersham et al.
patent: 5244749 (1993-09-01), Bean et al.
patent: 5265143 (1993-11-01), Early et al.
patent: 5310603 (1994-05-01), Fukuda et al.
patent: 5356662 (1994-10-01), Early et al.
patent: 5500312 (1996-03-01), Harriott et al.
Kola et al, Appl. Phys. Lett. 60,3120 (1992). (Jun.).
Rosen et al, Nanostruc. Mater. 3, 195 (1993). (no month).
Nguyen et al, (Optical Society of America, Washington, D.C., 1994), vol. 23, p. 56. (no month).
Nguyen et al, Physics of X-Ray Multilayer Structures (Optical Society of America, Wash. D.C. 1994), vol. 6, p. 103. (no month).
Windt et al, J. Appl. Phys. 78, 2423 (1995). (Aug.).
Kassner et al, J. Mat. Sci. 31, 2291 (1996). (no month).
Tinone et al, J. Electron Spectrosc. Relat. Phenom. 80, 461 (1996). (no month).

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