Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-05-23
2006-05-23
Mohamedulla, Saleha R. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C250S492300, C355S018000
Reexamination Certificate
active
07049033
ABSTRACT:
Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.
REFERENCES:
patent: 5399448 (1995-03-01), Nagata et al.
patent: 6319635 (2001-11-01), Mirkarimi et al.
patent: 6635391 (2003-10-01), Stearns et al.
patent: 0279670 (1988-08-01), None
Mirkarimi Paul B.
Stearns Daniel G.
Sweeney Donald W.
Mohamedulla Saleha R.
The EUV LLC
Thompson Alan H.
Wooldridge John P.
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