4. Radiation imagery chemistry: process, composition, or product th
  5. Radiation modifying product or process of making
  6. Radiation mask

Osamu Nagarekawa

Inventor

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Method of manufacturing a mask blank including a modified chromi

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Photo-mask blank for use in lithography including a modified chr

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent

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Photomask blank

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Design Patent

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Photomask blank

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Design Patent

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Photomask blank

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Design Patent

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Profile ID: LFUS-PAI-P-857552

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