Photomask blank

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit

Design Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Design Patent

active

29276360

CLAIM:
The ornamental design for a photomask blank, as shown and described.

REFERENCES:
patent: 1676741 (1928-07-01), Moskowitz
patent: 2728451 (1955-12-01), Leander
patent: 5112727 (1992-05-01), Inui et al.
patent: 5217256 (1993-06-01), Lomas
patent: 5234781 (1993-08-01), Sakamoto et al.
patent: 6122035 (2000-09-01), Rolson
patent: D441730 (2001-05-01), Oba
patent: 6285783 (2001-09-01), Isomura et al.
patent: D502866 (2005-03-01), Woollard
patent: D537048 (2007-02-01), Mitsui
patent: D543160 (2007-05-01), Mitsui et al.
patent: 2002/0187407 (2002-12-01), Priestley et al.
patent: 2003/0118918 (2003-06-01), Ohta
patent: 2003/0198873 (2003-10-01), Kokjohn
patent: 2004/0265708 (2004-12-01), Misaka
patent: 2005/0120326 (2005-06-01), Semmler et al.
patent: 2005/0147893 (2005-07-01), Ogawa et al.
patent: 2005/0269814 (2005-12-01), Dillavou et al.
U.S. Appl. No. 29/213,840, filed Sep. 23, 2004, Inventor: Masaru Mitsui; Entitled: Photomask Blank.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photomask blank does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask blank, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask blank will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3911789

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.